Structure and electric properties of TiO2 films prepared by cold plasma torch under atmospheric pressure

doi:10.1016/S0921-5107(96)01641-8

Materials Science and Engineering: B

Volume 41, Issue 1, October 1996, Pages 143-147

https://doi.org/10.1016/S0921-5107(96)01641-8 Get rights and content

Abstract

A torch-like plasma generator we developed to make low temperature material processing possible in open air conditions was employed lor the deposition of TiO₂ films on substrates exposed to air. Ti(OEt)₄ or Ti(O-iPr)₄ vapor was fed into the plasma generated in an insulator nozzle lining the inner surface of a grounded cylindrical anode and containing a metal needle cathode at the center. The homogeneous plasma with T_c of 1.8 eV and T_g of 2()0 °C. respectively, could decompose Ti(OR)₄ to flush decomposition species onto a substrate placed in air. The film thus prepared was stoichiometric and amorphous TiO₂, but contained short-range crystallinity. The phase structure of the films changed by the admixing of hydrogen in the plasma. The TiO₂ film deposited from a TEOT H₂ mixture had a high breakdown electric field (1.2 MV cm ⁻¹) as well as a high dielectric constant (ɛ= 54) even in amorphous phase.

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Structure and electric properties of TiO2 films prepared by cold plasma torch under atmospheric pressure

Abstract

Thin Solid Films.

J. Electrochem. Soc.

J. Appl. Phys.

Appl. Phys. A.

Phys. Rev. B

Appl. Phys. Lett.

Structure and electric properties of TiO₂ films prepared by cold plasma torch under atmospheric pressure