Plasma-based treatment of chronic wounds or skin diseases as well as tissue engineering or tumor treatment is an extremely promising field. First practical studies are promising, and plasma medicine as an independent medical field is emerging worldwide. While during the last years the basics of sterilizing effects of plasmas were well studied, concepts of tailor-made plasma sources which meet the technical requirements of medical instrumentation are still less developed. Indeed, studies on the verification of selective antiseptic effects of plasmas are required, but the development of advanced plasma sources for biomedical applications and a profound knowledge of their physics, chemistry, and parameters must be contributed by physical research. Considering atmospheric-pressure plasma sources, the determination of discharge development and plasma parameters is a great challenge, due to the high complexity and limited diagnostic approaches. This contribution gives an overview on plasma sources for therapeutic applications in plasma medicine. Selected specific plasma sources that are used for the investigation of various biological effects are presented and discussed. Furthermore, the needs, prospects, and approaches for its characterization from the fundamental plasma physical point of view will be discussed.
Conference
International Symposium on Plasma Chemistry (ISPC-19), International Symposium on Plasma Chemistry, ISPC, Plasma Chemistry, 19th, Bochum, Germany, 2009-07-26–2009-07-31
References
1 10.1109/TPS.2009.2017267, M. Laroussi. IEEE Trans. Plasma Sci.37, 714 (2009).Search in Google Scholar
2 10.1002/ppap.200700154, G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, A. Fridman. Plasma Process. Polym.5, 503 (2008).Search in Google Scholar
3 E. Stoffels, I. E. Kieft, R. E. J. Sladek, E. P. van der Laan, D. W. Slaaf. Crit. Rev. Biomed. Eng. 34 (2004).Search in Google Scholar
4 10.1002/ctpp.200710007, E. Stoffels. Contrib. Plasma Phys.47, 40 (2007).Search in Google Scholar
5 10.1088/1367-2630/11/11/115012, M. G. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. van Dijk, J. L. Zimmermann. New J. Phys.11, 115012 (2009).Search in Google Scholar
6 10.1023/A:1013196629791, S. Lerouge, M. R. Wertheimer, L. Yahia. Plasmas Polym.6, 175 (2001).Search in Google Scholar
7 10.1002/ppap.200400078, M. Laroussi. Plasma Processes Polym.2, 391 (2005).Search in Google Scholar
8 10.1088/0022-3727/39/16/S07, M. K. Boudam, M. Moisan, B. Saoudi, C. Popovici, N. Gherardi, F. Massines. J. Phys. D: Appl. Phys.39, 3494 (2006).Search in Google Scholar
9 10.1016/S0257-8972(00)00803-3, R. Ben Gadri, J. R. Roth, T. C. Montie, K. Kelly-Wintenberg, P. P. Y. Tsai, D. J. Helfritch, P. Feldman, D. M. Sherman, F. Karakaya, Z. Y. Chen. Surf. Coat. Technol.131, 528 (2000).Search in Google Scholar
10 10.1023/B:PAPO.0000039814.70172.c0, M. Heise, W. Neff, O. Franken, P. Muranyi, J. Wunderlich. Plasmas Polym.9, 23 (2004).Search in Google Scholar
11 10.1016/S0378-5173(01)00752-9, M. Moisan, J. Barbeau, S. Moreau, J. Pelletier, M. Tabrizian, L. H. Yahia. Int. J. Pharm.226, 1 (2001).Search in Google Scholar
12 10.1088/0022-3727/41/19/194008, K. D. Weltmann, R. Brandenburg, T. von Woedtke, J. Ehlbeck, R. Foest, M. Stieber, E. Kindel. J. Phys. D: Appl. Phys.41, 194008 (2008).Search in Google Scholar
13 10.1088/0022-3727/39/16/S10, J. Raiser, M. Zenker. J. Phys. D: Appl. Phys.39, 3520 (2006).Search in Google Scholar
14 10.1002/ctpp.200710010, K. R. Stalder, J. Woloszko. Contrib. Plasma Phys.47, 64 (2007).Search in Google Scholar
15 10.1088/0022-3727/38/11/014, K. R. Stalder, D. F. McMillen, J. Woloszko. J. Phys. D: Appl. Phys.38, 1728 (2005).Search in Google Scholar
16 10.1088/0022-3727/39/16/S08, S. Yonson, S. Coulombe, V. Leveille, R. L. Leask. J. Phys. D: Appl. Phys.39, 3508 (2006).Search in Google Scholar
17 10.1351/pac200678061147, S. Coulombe, V. Leveille, S. Yonson, R. L. Leask. Pure Appl. Chem.78, 1147 (2006).Search in Google Scholar
18 10.1007/s11090-006-9024-4, G. Fridman, M. Peddinghaus, H. Ayan, A. Fridman, M. Balasubramanian, A. Gutsol, A. Brooks, G. Friedman. Plasma Chem. Plasma Process.26, 425 (2006).Search in Google Scholar
19 10.1109/TPS.2004.832636, R. E. J. Sladek, E. Stoffels, R. Walraven, P. J. A. Tielbeek, R. A. Koolhoven. IEEE Trans. Plasma Sci.32, 1540 (2004).Search in Google Scholar
20 10.1109/TPS.2009.2014870, C. Q. Jiang, M. T. Chen, C. Schaudinn, A. Gorur, P. T. Vernier, J. W. Costerton, D. E. Jaramillo, P. P. Sedghizadeh, M. A. Gundersen. IEEE Trans. Plasma Sci.37, 1190 (2009).Search in Google Scholar
21 W. Stolz, M. Georgi, H.-U. Schmidt, K. Ramrath, R. Pompl, T. Shimizu, B. Steffes, W. Bunk, B. Peters, F. Jamitzky, G. Morfill. First International Conference on Plasma Medicine (ICPM-1), Corpus Christi, TX, USA (2007).Search in Google Scholar
22 G. Isbary, W. Stolz, M. Georgi, H.-U. Schmidt, R. Pompl, T. Shimizu, B. Steffes, W. Bunk, F. Jamitzky, S. Fujii, G. Morfill. Second International Conference on Plasma Medicine (ICPM-2), San Antonio, TX, USA (2009).Search in Google Scholar
23 10.1002/ppap.200700162, F. Iza, G. J. Kim, S. M. Lee, J. K. Lee, J. L. Walsh, Y. T. Zhang, M. G. Kong. Plasma Process. Polym.5, 322 (2008).Search in Google Scholar
24 10.1002/ppap.200600217, G. Fridman, A. D. Brooks, M. Balasubramanian, A. Fridman, A. Gutsol, H. N. Vasilets, A. Ayan, G. Friedman. Plasma Process. Polym.4, 370 (2007).Search in Google Scholar
25 10.1002/ppap.200700066, M. Laroussi, T. Akan. Plasma Process. Polym.4, 777 (2007).Search in Google Scholar
26 10.1023/A:1022470901385, U. Kogelschatz. Plasma Chem. Plasma Process.23, 1 (2003).Search in Google Scholar
27 10.1016/S0042-207X(02)00765-0, H. E. Wagner, R. Brandenburg, K. V. Kozlov, A. Sonnenfeld, P. Michel, J. F. Behnke. Vacuum71, 417 (2003).Search in Google Scholar
28 10.1088/0022-3727/39/3/R01, K. H. Becker, K. H. Schoenbach, J. G. Eden. J. Phys. D: Appl. Phys.39, R55 (2006).Search in Google Scholar
29 10.1002/ctpp.200710012, U. Kogelschatz. Contrib. Plasma Phys.47, 80 (2007).Search in Google Scholar
30 10.1063/1.1401791, S. J. Park, J. G. Eden, J. Chen, C. Liu. Appl. Phys. Lett.79, 2100 (2001).Search in Google Scholar
31 10.1063/1.125724, J. Park, I. Henins, H. W. Herrmann, G. S. Selwyn, J. Y. Jeong, R. F. Hicks, D. Shim, C. S. Chang. Appl. Phys. Lett.76, 288 (2000).Search in Google Scholar
32 10.1109/27.747887, A. Schutze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn, R. F. Hicks. IEEE Trans. Plasma Sci.26, 1685 (1998).Search in Google Scholar
33 10.1088/0963-0252/11/4/304, E. Stoffels, A. J. Flikweert, W. W. Stoffels, G. M. W. Kroesen. Plasma Sources Sci. Technol.11, 383 (2002).Search in Google Scholar
34 10.1002/bem.20005, I. E. Kieft, J. L. V. Broers, V. Caubet-Hilloutou, D. W. Slaaf, F. C. S. Ramaekers, E. Stoffels. Bioelectromagnetics25, 362 (2004).Search in Google Scholar PubMed
35 10.1109/TPS.2005.844528, I. E. Kieft, D. Darios, A. J. M. Roks, E. Stoffels. IEEE Trans. Plasma Sci.33, 771 (2005).Search in Google Scholar
36 10.1088/0022-3727/38/11/012, R. E. J. Sladek, E. Stoffels. J. Phys. D: Appl. Phys.38, 1716 (2005).Search in Google Scholar
37 E. Stoffels, R. E. J. Sladek, I. E. Kieft. Phys. Scr.107, 4 (2004).Search in Google Scholar
38 10.1088/0022-3727/36/23/007, E. Stoffels, I. E. Kieft, R. E. J. Sladek. J. Phys. D: Appl. Phys.36, 2908 (2003).Search in Google Scholar
39 10.1088/0963-0252/15/4/S03, E. Stoffels, I. E. Kieft, R. E. J. Sladek, L. J. M. van den Bedem, E. P. van der Laan, M. Steinbuch. Plasma Sources Sci. Technol.15, S169 (2006).Search in Google Scholar
40 10.1088/0022-3727/41/19/194008, K. D. Weltmann, R. Brandenburg, T. von Woedtke, J. Ehlbeck, R. Foest, M. Stieber, E. Kindel. J. Phys. D: Appl. Phys.41, 194008 (2008).Search in Google Scholar
41 10.1002/ctpp.200910067, K. D. Weltmann, E. Kindel, R. Brandenburg, C. Meyer, R. Bussiahn, C. Wilke, T. von Woedtke. Contrib. Plasma Phys.49, 631 (2009).Search in Google Scholar
42 H. Lange, R. Foest, J. Schafer, K. D. Weltmann. IEEE Trans. Plasma Sci.37, 859 (2009).Search in Google Scholar
43 10.1002/ctpp.200710017, R. Foest, E. Kindel, H. Lange, A. Ohl, M. Stieber, K. D. Weltmann. Contrib. Plasma Phys.47, 119 (2007).Search in Google Scholar
44 R. Brandenburg, H. Lange, T. von Woedtke, M. Stieber, E. Kindel, J. Ehlbeck, K. D. Weltmann. IEEE Trans. Plasma Sci.37, 877 (2009).Search in Google Scholar
45 10.1002/ctpp.200910067, K.-D. Weltmann, E. Kindel, R. Brandenburg, C. Meyer, R. Bussiahn, C. Wilke, T. von Woedtke. Contrib. Plasma Phys.49, 631 (2009).Search in Google Scholar
46 10.1088/0022-3727/33/20/315, V. I. Gibalov, G. J. Pietsch. J. Phys. D: Appl. Phys.33, 2618 (2000).Search in Google Scholar
47 10.1002/1521-3986(200111)41:6<620::AID-CTPP620>3.0.CO;2-H, G. J. Pietsch. Contrib. Plasma Phys.41, 620 (2001).Search in Google Scholar
48 10.1002/ppap.200900076, M. Hähnel, T. von Woedtke, K.-D. Weltmann. Plasma Process. Polym.7, 244 (2010).Search in Google Scholar
49 10.1002/ppap.200700015, M. Hahnel, V. Bruser, H. Kersten. Plasma Process. Polym.4, 629 (2007).Search in Google Scholar
50 10.1002/ppap.200900077, K. Oehmigen, M. Hähnel, R. Brandenburg, C. Wilke, K.-D. Weltmann, T. von Woedtke. Plasma Process. Polym.7, 250 (2010).Search in Google Scholar
51 10.1051/jp4:1997405, U. Kogelschatz, B. Eliasson, W. Egli. J. Phys. IV7, 47 (1997).Search in Google Scholar
52 10.1063/1.364386, Z. Falkenstein. J. Appl. Phys.81, 5975 (1997).Search in Google Scholar
53 10.1109/TPS.2002.804182, F. J. Trompeter, W. J. Neff, O. Franken, M. Heise, M. Neiger, S. H. Liu, G. J. Pietsch, A. B. Saveljew. IEEE Trans. Plasma Sci.30, 1416 (2002).Search in Google Scholar
54 10.1002/ppap.200731208, S. Tümmel, N. Mertens, J. Wang, W. Viöl. Plasma Process. Polym.4, S465 (2007).Search in Google Scholar
55 G. Fridman, A. Gutsol, V. Vasilets, A. Fridman, G. Friedman. ISPC 18 (Kyoto), p. 4 (2007).10.1002/ppap.200600217Search in Google Scholar
56 G. Fridman, R. Sensing, S. Kalghatgi, A. Shereshevsky, M. Balasubramanian, A. Gutsol, V. Vasilets, A. Brooks, A. Fridman, G. Friedman. ISPC 18 (Kyoto), p. 4 (2007).10.1002/ppap.200600217Search in Google Scholar
57 G. Fridman, A. Shereshevsky, M. Balasubramanian, M. Peddinghaus, A. Brooks, A. Gutsol, V. Vasilets, A. Fridman, G. Friedman. ISPC 18 (Kyoto), p. 4 (2007).10.1002/ppap.200600217Search in Google Scholar
58 10.1109/TPS.2002.804201, U. Kogelschatz. IEEE Trans. Plasma Sci.30, 1400 (2002).Search in Google Scholar
59 H. E. Wagner, R. Brandenburg, K. V. Kozlov. J. Adv. Oxidation Technol.7, 11 (2004).Search in Google Scholar
60 10.1088/0022-3727/20/11/010, B. Eliasson, M. Hirth, U. Kogelschatz. J. Phys. D: Appl. Phys.20, 1421 (1987).Search in Google Scholar
61 10.1088/0022-3727/34/21/309, K. V. Kozlov, H. E. Wagner, R. Brandenburg, P. Michel. J. Phys. D: Appl. Phys.34, 3164 (2001).Search in Google Scholar
62 10.1088/0963-0252/10/3/308, C. Lukas, M. Spaan, V. Schulz-von der Gathen, M. Thomson, R. Wegst, H. F. Dobele, M. Neiger. Plasma Sources Sci. Technol.10, 445 (2001).Search in Google Scholar
63 10.1002/ctpp.200710066, V. Schulz-von der Gathen, V. Buck, T. Gans, N. Knake, K. Niemi, S. Reuter, L. Schaper, J. Winter. Contrib. Plasma Phys.47, 510 (2007).Search in Google Scholar
64 10.1088/0022-3727/42/5/055207, N. Mericam-Bourdet, M. Laroussi, A. Begum, E. Karakas. J. Phys. D: Appl. Phys.42, 055207 (2009).Search in Google Scholar
65 10.1109/TPS.2008.917789, B. L. Sands, B. N. Ganguly, K. Tachibana. IEEE Trans. Plasma Sci.36, 956 (2008).Search in Google Scholar
66 10.1109/TPS.2008.922432, M. Laroussi, W. Hynes, T. Akan, X. P. Lu, C. Tendero. IEEE Trans. Plasma Sci.36, 1298 (2008).Search in Google Scholar
67 10.1063/1.2828551, J. J. Shi, F. C. Zhong, J. Zhang, D. W. Liu, M. G. Kong. Phys. Plasmas15, 013504 (2008).Search in Google Scholar
68 10.1109/TPS.2005.845377, M. Teschke, J. Kedzierski, E. G. Finantu-Dinu, D. Korzec, J. Engemann. IEEE Trans. Plasma Sci.33, 310 (2005).Search in Google Scholar
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